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Ultra-high purity formulation with minimal trace impurities for demanding electronic and pharmaceutical applications.
Consistent batch-to-batch quality ensured by Eastman’s controlled manufacturing and rigorous QC protocols.
Low water content (< 50 ppm) to prevent hydrolysis in moisture-sensitive synthesis and coating processes.
High solvency power for resins, cellulose derivatives, and specialty polymers without compromising film clarity.
Optimized volatility profile—faster evaporation than MEK yet slower than acetone—for balanced drying and leveling in coatings.
High-performance electronic cleaning and precision defluxing of printed circuit boards (PCBs).
Solvent carrier in photoresist formulations for semiconductor lithography.
Co-solvent in high-solids aerospace and automotive clearcoats requiring low haze and excellent flow.
Reaction medium for controlled Grignard and hydride reductions in fine chemical synthesis.
Extraction solvent in cGMP-compliant API purification where residual solvent limits are stringent.
| Chemical Type | Methyl propyl ketone (2-hexanone), C6H12O |
| Product Form | Liquid at room temperature |
| Appearance | Clear, colorless liquid |
| Odor | Characteristic mild ketonic odor |
| Primary Applications | Electronics cleaning, photoresist formulation, high-performance coatings, fine chemical synthesis |
| Key Features | Ultra-high purity, low water content, low residue, low halide content |
| Storage Stability | Stable under recommended conditions (cool, dry, inert atmosphere) |
| Regulatory Compliance | REACH registered; meets USP/EP residual solvent Class 3 guidelines |
Contact With Us:
E-mail: wangxingqiang@ericwchem.com
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Building A1, Jiete Industrial Park, Huangpu District, Guangzhou City, Guangdong Province, China
