Guangzhou Eric Wei Chemical Co., Ltd.
Guangzhou Eric Wei Chemical Co., Ltd.

Evonik 4-HBA 4-Hydroxybutyl Acrylate

Evonik’s RAFT-series 4-HBA (4-Hydroxybutyl Acrylate) is a reactive bifunctional acrylic monomer featuring high hydrophilicity and excellent adhesion. It enables precise polymer architecture control via RAFT polymerization, delivering superior water resistance, flexibility, and UV stability in coatings, adhesives, and biomedical hydrogels. Pure, low-color, and consistently high-purity for demanding industrial applications.
  • evonik 4 hba 4 hydroxybutyl acrylate_b387779b
  • evonik 4 hba 4 hydroxybutyl acrylate_b387779b

Features Of Evonik 4-HBA 4-Hydroxybutyl Acrylate

  1. Highly reactive acrylate monomer with pendant hydroxyl functionality for crosslinking and polarity enhancement.

  2. Excellent compatibility with common acrylic, vinyl, and urethane monomers and oligomers.

  3. Enables formulation of low-VOC, high-solids UV-curable and thermally curable coatings.

  4. Provides improved adhesion to polar substrates including plastics, metals, and treated films.

  5. Stabilized with MEHQ inhibitor for extended shelf life and handling safety.

Typical Applications Of Evonik 4-HBA 4-Hydroxybutyl Acrylate

  1. UV-curable inkjet inks for flexible packaging and decorative printing.

  2. High-performance clearcoats and topcoats for automotive and industrial finishes.

  3. Functional coatings for optical films and touch-sensitive display components.

  4. Adhesion promoters in pressure-sensitive adhesive (PSA) formulations.

  5. Crosslinking monomer in waterborne and hybrid acrylic dispersions for architectural and wood coatings.

Specifications Of Evonik 4-HBA 4-Hydroxybutyl Acrylate

Chemical TypeAcrylic monomer with primary hydroxyl group
Product FormLiquid
AppearanceColorless to pale yellow, clear liquid
Primary ApplicationsUV-curable coatings, inks, adhesives, and functional polymer modifiers
Key FeaturesReactive hydroxyl group, low volatility, good hydrolytic stability
BenefitsEnhanced crosslink density, substrate adhesion, and formulation flexibility
InhibitorMEHQ (10–50 ppm)
Storage ConditionsStore under nitrogen at 5–25 °C, protected from light and moisture


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