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Ultra-pure water (UPW) grade resin specifically engineered for semiconductor and pharmaceutical ultrapure water systems.
Highly crosslinked gel-type strong acid cation exchange resin with exceptional chemical stability in aggressive regeneration environments.
Low total organic carbon (TOC) extractables to minimize downstream contamination risk in critical UPW applications.
Consistent spherical bead morphology ensures uniform hydraulic performance and low pressure drop across service cycles.
Optimized for high-efficiency sodium leakage control and rapid regeneration kinetics in mixed-bed polishing configurations.
Final polishing stage in ultrapure water (UPW) systems for semiconductor wafer fabrication facilities.
Pharmaceutical water-for-injection (WFI) and purified water (PW) production systems requiring USP/EP compliance.
Mixed-bed ion exchange units in high-purity power plant boiler feedwater treatment.
Critical microelectronics manufacturing processes where sub-part-per-trillion ionic contamination limits apply.
Research-grade laboratory water purification systems demanding ultra-low conductivity and silica rejection.
| Chemical Type | Strong Acid Cation (SAC), sulfonated polystyrene-divinylbenzene copolymer |
| Product Form | Moist, spherical beads (H⁺ form) |
| Appearance | Amber, translucent, uniform spherical beads |
| Functional Group | Sulfonic acid (–SO₃H) |
| Ion Exchange Capacity (min.) | 1.9 eq/L (dry basis) |
| Moisture Content (as shipped) | 45–50% (w/w) |
| Particle Size Range | 0.3–1.2 mm (95% retained on 0.3 mm sieve) |
| Uniformity Coefficient (max.) | 1.6 |
Q1: What is the primary application of DOW MR-3UPW ion exchange resin?
A: DOW MR-3UPW is specifically engineered for polishing ultrapure water (UPW) systems in semiconductor manufacturing, pharmaceutical production, and other high-purity process applications where extremely low levels of ionic contaminants—including trace metals and silica—are required.
Q2: How does DOW MR-3UPW differ from standard mixed-bed resins?
A: Unlike conventional mixed-bed resins, DOW MR-3UPW features ultra-low extractables, tightly controlled particle size distribution, and enhanced chemical stability—enabling consistent resistivity >18.2 MΩ·cm and minimal organic leaching under continuous UPW service conditions.
Q3: Is DOW MR-3UPW suitable for use in hot or pressurized UPW loops?
A: Yes—DOW MR-3UPW is designed for reliable performance in both ambient and elevated-temperature UPW service (up to 50 °C), and maintains structural integrity under typical distribution loop pressures when installed per Dow’s recommended bed configuration and flow guidelines.
Q4: What regeneration protocol is recommended for DOW MR-3UPW?
A: DOW MR-3UPW is intended for single-use, non-regenerable polishing applications. It is supplied in fully regenerated, ready-to-install form and is typically replaced upon exhaustion—ensuring predictable, contamination-free performance without on-site acid/base handling risks.
Contact With Us:
E-mail: wangxingqiang@ericwchem.com
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Building A1, Jiete Industrial Park, Huangpu District, Guangzhou City, Guangdong Province, China
