Guangzhou Eric Wei Chemical Co., Ltd.
Guangzhou Eric Wei Chemical Co., Ltd.

Dow TPM Tripropylene Glycol Monomethyl Ether

Dow TPM Tripropylene Glycol Monomethyl Ether is a high-purity, low-volatility glycol ether solvent from Dow’s TPM series—designed for coatings, inks, and cleaners. It offers excellent solvency, slow evaporation rate, low odor, and favorable HSE profile versus traditional solvents like PM. Widely used as a coalescent and active ingredient in industrial formulations requiring balance of performance and regulatory compliance.
  • dow tpm tripropylene glycol monomethyl ether_d7df16e1
  • dow tpm tripropylene glycol monomethyl ether_d7df16e1

Features Of Dow TPM Tripropylene Glycol Monomethyl Ether

  1. Low volatility with high boiling point for extended open time in coatings and inks.

  2. Excellent solvency for resins including acrylics, alkyds, and cellulose esters.

  3. Low water solubility enhances compatibility in hydrophobic formulations.

  4. Favorable evaporation rate profile—slower than PGMEA, faster than DPM—enabling balanced drying control.

  5. Low odor and reduced HAPs (Hazardous Air Pollutants) content versus traditional glycol ether solvents.

Typical Applications Of Dow TPM Tripropylene Glycol Monomethyl Ether

  1. Architectural and industrial water-reducible coatings.

  2. High-solids coil and can coatings.

  3. Gravure and flexographic printing inks.

  4. Industrial cleaning formulations for precision degreasing.

  5. Additive carrier in agrochemical concentrates.

Specifications Of Dow TPM Tripropylene Glycol Monomethyl Ether

Chemical TypeGlycol ether (propylene glycol-based)
Product FormLiquid
AppearanceClear, colorless liquid
OdorMild, characteristic ether-like
Primary ApplicationsSolvent for coatings, inks, cleaners, and agrochemicals
Key FeaturesLow volatility, low water solubility, good resin solvency
BenefitsImproved formulation stability, controlled drying, reduced VOC contribution
Regulatory StatusNot listed as a VOC under U.S. EPA Method 24; not classified as HAP


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