Kukdo KD-264 is a high-chemical-resistant solid bisphenol A epoxy resin in KD series, designed for industrial protective powder coatings in corrosive environments. It is off-white solid particles, resistant to strong acids/alkalis and organic solvents, high film density, strong adhesion, ideal for chemical industry protective coating.
Super chemical resistance - Resists immersion in 50% sulfuric acid/20% sodium hydroxide for ≥1000h without blistering or peeling
Dense film protection - Film porosity ≤0.1%, isolating corrosive medium penetration with high protection level
Wide temperature adaptability - Stable use in -40℃~120℃ working conditions with excellent temperature change resistance
Strong substrate anchoring - 0-grade adhesion to chemical equipment metal substrates, anti-medium peeling
Good process adaptability - Controllable melt fluidity, suitable for thick/thin coating spraying processes
Chemical equipment coating - High-chemical-resistant protective coating for reactor and storage tank inner walls
Electroplating production line coatings - Acid-alkali corrosion-resistant protective coating for electroplating tanks and hangers
Environmental treatment equipment - Corrosion-resistant protective coating for sewage treatment equipment and desulfurization tower accessories
Marine engineering accessories - Salt spray + chemical-resistant protective coating for offshore operation equipment accessories
Acid-alkali transportation pipelines - Inner wall protective coating for chemical acid-alkali medium transportation pipelines
| Chemical Category | Modified Bisphenol A Epoxy Resin |
| Epoxy Equivalent (g/mol) | 245-275 |
| Softening Point (℃) | 72-82 |
| Melt Viscosity (150℃, mPa·s) | 25-40 |
| Gel Time (170℃, sec) | 48-78 |
| Volatile Content (%) | ≤0.2 |
| Acid Resistance (h) | ≥1000 (50% Sulfuric Acid) |
| Alkali Resistance (h) | ≥1000 (20% Sodium Hydroxide) |
| Porosity (%) | ≤0.1 |
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E-mail: wangxingqiang@ericwchem.com
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Building A1, Jiete Industrial Park, Huangpu District, Guangzhou City, Guangdong Province, China