Guangzhou Eric Wei Chemical Co., Ltd.
Guangzhou Eric Wei Chemical Co., Ltd.

Tosoh Tosoh PIP Piperazine

Tosoh Tosoh PIP Piperazine is a high-purity piperazine derivative from Tosoh’s PIP series, widely used as a corrosion inhibitor and CO₂ capture solvent in gas treatment. Featuring exceptional thermal stability, low volatility, and superior reactivity, it enables efficient amine-based scrubbing systems. Manufactured under strict quality control, Tosoh PIP Piperazine ensures consistent performance in industrial-scale carbon capture and chemical synthesis applications.
  • tosoh tosoh pip piperazine_0208a1d1
  • tosoh tosoh pip piperazine_0208a1d1

Features Of Tosoh Tosoh PIP Piperazine

  1. High-purity piperazine derivative with consistent batch-to-batch reproducibility.

  2. Excellent thermal and hydrolytic stability under industrial processing conditions.

  3. Low volatility and low vapor pressure, enhancing handling safety and process control.

  4. Optimized solubility profile in both polar organic solvents and aqueous systems.

  5. Minimal residual metals and chloride content, suitable for high-sensitivity catalytic and pharmaceutical applications.

Typical Applications Of Tosoh Tosoh PIP Piperazine

  1. Key intermediate in the synthesis of pharmaceutical active ingredients (APIs), including antifungal and anthelmintic agents.

  2. Catalyst modifier and ligand precursor in transition-metal-catalyzed cross-coupling reactions.

  3. Building block for specialty polyamide and polyurea polymers requiring enhanced toughness and chemical resistance.

  4. Functional additive in gas treatment formulations for selective CO₂ and H₂S capture.

  5. Stabilizer and curing agent in advanced epoxy resin systems for electronics encapsulation.

Specifications Of Tosoh Tosoh PIP Piperazine

Chemical TypePiperazine-based heterocyclic amine derivative
Product FormWhite to off-white crystalline solid
AppearanceFree-flowing crystalline powder
Purity (by GC)≥ 99.5%
Melting Point106–109 °C
Loss on Drying≤ 0.5% (at 105 °C, 2 h)
Residue on Ignition≤ 0.1%
Primary ApplicationsPharmaceutical intermediates, polymer synthesis, gas treating, catalyst design


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