Guangzhou Eric Wei Chemical Co., Ltd.
Guangzhou Eric Wei Chemical Co., Ltd.

DOW MR-450UPW Polishing Ion Exchange Resin

DOW MR-450UPW Polishing Ion Exchange Resin is a high-purity, ultra-low-leachable mixed-bed resin from Dow’s MR series, engineered for final polishing in ultrapure water systems. It delivers exceptional silica and TOC removal, low sodium leakage, and stable performance in semiconductor and pharmaceutical UPW applications.
  • dow mr 450upw polishing ion exchange resin_0ff67988
  • dow mr 450upw polishing ion exchange resin_0ff67988

Features Of DOW MR-450UPW Polishing Ion Exchange Resin

  1. Ultra-low total organic carbon (TOC) leachables for stringent ultrapure water (UPW) specifications.

  2. Optimized mixed-bed formulation with uniform particle size distribution for consistent pressure drop and flow dynamics.

  3. High chemical stability in both acidic and basic regeneration environments, ensuring extended service life.

  4. Low sodium and silica leakage enabling compliance with SEMI F63 and ASTM D5127 UPW standards.

  5. Pre-compacted and pre-conditioned for rapid start-up and minimal commissioning time in polishing systems.

Typical Applications Of DOW MR-450UPW Polishing Ion Exchange Resin

  1. Final polishing stage in semiconductor-grade ultrapure water (UPW) generation systems.

  2. Pharmaceutical water-for-injection (WFI) and purified water (PW) polishing loops.

  3. Advanced power plant boiler feedwater polishing for supercritical and ultra-supercritical turbines.

  4. Microelectronics fabrication facility UPW distribution networks requiring sub-ppt ionic contamination control.

  5. Research laboratory ultrapure water systems demanding reproducible resistivity >18.2 MΩ·cm at 25°C.

Specifications Of DOW MR-450UPW Polishing Ion Exchange Resin

Chemical TypeStrong acid cation (SAC) / strong base anion (SBA) mixed bed resin
Product FormPre-mixed, pre-compacted, fully regenerated mixed bed resin
AppearanceUniform spherical beads; dark brown (cation) and amber (anion) color blend
Primary ApplicationsUltrapure water (UPW) final polishing in semiconductor, pharmaceutical, and power industries
Key FeaturesLow TOC leachables, high regeneration efficiency, low rinse water demand
BenefitsReduced downtime, minimized risk of ionic contamination, extended cycle life
Storage ConditionsStore dry at 5–35°C; avoid freezing and direct sunlight
Regeneration CompatibilityCompatible with standard NaOH/HCl regenerants; optimized for low-concentration protocols


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