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High-capacity, gel-type strong base anion exchange resin with Type I functionalization.
Optimized for low-silica removal and high chloride selectivity in mixed-bed and polishing applications.
Excellent physical and chemical stability across a wide pH range (0–14) and temperature up to 60 °C.
Low total organic carbon (TOC) extractables, minimizing post-treatment contamination in ultrapure water systems.
Consistent bead quality and narrow particle size distribution for uniform hydraulic performance and reduced pressure drop.
Final polishing stage in semiconductor-grade ultrapure water (UPW) production systems.
Power plant condensate polishing for steam cycle purity and corrosion control.
Pharmaceutical water purification meeting USP <701>, EP, and JP pharmacopeial requirements.
Electronics manufacturing process water where low sodium, silica, and TOC are critical.
Mixed-bed configurations with cation resins for high-resistivity water generation (>18.0 MΩ·cm).
| Chemical Type | Strong base anion exchange resin, Type I quaternary ammonium |
| Product Form | Moist, spherical beads |
| Appearance | Off-white to light yellow, translucent beads |
| Functional Group | –N(CH₃)₃Cl |
| Ion Form | Chloride (Cl⁻) |
| Total Exchange Capacity (min.) | 1.2 eq/L (dry) |
| Moisture Content | 45–50% (as shipped) |
| Uniformity Coefficient (max.) | 1.6 |
Contact With Us:
E-mail: wangxingqiang@ericwchem.com
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Building A1, Jiete Industrial Park, Huangpu District, Guangzhou City, Guangdong Province, China
