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Highly uniform spherical beads for consistent hydraulic performance and low pressure drop.
Superior chemical and osmotic stability, enabling reliable operation in demanding regeneration cycles.
Optimized for high-efficiency hydroxide-form polishing in ultrapure water systems.
Low total organic carbon (TOC) extractables, minimizing contamination risk in semiconductor and pharmaceutical water loops.
Engineered with macroporous structure to enhance kinetics and resist fouling from organics and colloids.
Final polishing stage in ultrapure water (UPW) systems for semiconductor manufacturing.
Pharmaceutical-grade purified water (PW) and water-for-injection (WFI) production.
Power plant boiler feedwater polishing to meet stringent silica and conductivity specifications.
Electronics industry rinse water purification requiring ultra-low ion leakage.
Critical laboratory water systems where reproducible resistivity >18.2 MΩ·cm is essential.
| Chemical Type | Strong base anion exchange resin, Type I, OH⁻ form |
| Product Form | Moist, spherical beads |
| Appearance | Amber-colored, translucent beads |
| Functional Group | Quaternary ammonium |
| Matrix Structure | Macroporous polystyrene-divinylbenzene copolymer |
| Ion Exchange Capacity (min) | 1.1 eq/L (OH⁻ form, wet) |
| Moisture Content | 47–53% (as shipped) |
| Particle Size Range | 300–1200 µm (95% retained on 16 mesh, passes 50 mesh) |
Contact With Us:
E-mail: wangxingqiang@ericwchem.com
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Building A1, Jiete Industrial Park, Huangpu District, Guangzhou City, Guangdong Province, China
