English
Español
tiếng việt
русский
Optimized cation/anion resin ratio for ultra-high purity water production with resistivity up to 18.2 MΩ·cm.
Pre-mixed and thoroughly blended in factory-controlled conditions to ensure consistent performance and reproducible regeneration behavior.
Low total organic carbon (TOC) extractables, minimizing post-treatment contamination risk in sensitive applications.
Excellent physical and chemical stability across wide pH range (0–14), supporting robust long-term operation.
Designed for use in polished deionization (DI) units requiring minimal footprint and high throughput efficiency.
Final polishing stage in ultrapure water (UPW) systems for semiconductor manufacturing.
Pharmaceutical-grade water production meeting USP <751>, EP 2.2.39, and JP standards.
Power plant boiler feedwater polishing to prevent corrosion and scaling in high-pressure steam cycles.
Laboratory water purification systems requiring Type I reagent water per ISO 3696:1995.
Electronics cleaning rinse water where low ionic and particulate contamination is critical.
| Chemical Type | Strong acid cation (H⁺ form) / strong base anion (OH⁻ form) mixed bed |
| Product Form | Uniform spherical beads, pre-mixed and ready-to-use |
| Appearance | Opaque light amber (cation) and off-white (anion) beads; visually homogeneous blend |
| Primary Applications | Ultrapure water polishing, pharmaceutical water, power generation, microelectronics |
| Key Features | Low TOC release, high exchange capacity, excellent regeneration efficiency |
| Benefits | Reduced downtime, extended service run length, compliance with stringent water quality standards |
| Storage Conditions | Store dry at 5–40 °C; avoid freezing and direct sunlight |
| Regeneration Compatibility | Compatible with standard acid (HCl/H₂SO₄) and alkali (NaOH) regenerants |
Contact With Us:
E-mail: wangxingqiang@ericwchem.com
Have a Questions? Call Us:
Add:
Building A1, Jiete Industrial Park, Huangpu District, Guangzhou City, Guangdong Province, China
