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Ultra-pure, nuclear-grade mixed bed resin specifically engineered for ultrapure water (UPW) polishing in semiconductor and pharmaceutical applications.
Exceptional kinetic performance with rapid ion exchange kinetics and low pressure drop across service cycles.
Highly uniform bead size distribution ensures consistent hydraulic performance and minimizes channeling in deep-bed columns.
Low total organic carbon (TOC) extractables and minimal leachables—certified to meet stringent USP <849> and SEMI F63 standards.
Optimized stoichiometric ratio of strong acid cation (SAC) and strong base anion (SBA) resins for balanced regeneration efficiency and extended cycle life.
Final polishing stage in ultrapure water systems for semiconductor wafer fabrication facilities.
Pharmaceutical water-for-injection (WFI) and purified water (PW) production systems requiring low endotoxin and TOC levels.
Critical power plant condensate polishing where high silica and sodium removal is essential for turbine protection.
Research-grade laboratory water systems demanding resistivity >18.2 MΩ·cm at 25°C and sub-ppt ionic contamination.
| Chemical Type | Strong acid cation (SAC) / strong base anion (SBA) mixed bed resin |
| Product Form | Uniform spherical beads, pre-mixed 1:1 (v/v) ratio |
| Appearance | Opaque off-white (SAC) and amber (SBA) beads, visually homogeneous blend |
| Primary Applications | Ultrapure water (UPW) polishing for semiconductor, pharmaceutical, and power industries |
| Key Features | Nuclear-grade purity, low TOC extractables, high uniformity, optimized regeneration response |
| Benefits | Extended run lengths, reduced rinse water consumption, compliance with SEMI F63 and USP <849> |
| Storage Temperature Range | 5–40 °C (41–104 °F) |
| Maximum Service Temperature | 50 °C (122 °F) |
Contact With Us:
E-mail: wangxingqiang@ericwchem.com
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Building A1, Jiete Industrial Park, Huangpu District, Guangzhou City, Guangdong Province, China
