Guangzhou Eric Wei Chemical Co., Ltd.
Guangzhou Eric Wei Chemical Co., Ltd.

DuPont AMBERJET UP 6150 Ion Exchange Resin

DuPont AMBERJET UP 6150 is a high-purity, nuclear-grade mixed-bed ion exchange resin designed for ultrapure water polishing in power and microelectronics industries. Featuring ultra-low TOC leachables and stringent quality control, it delivers exceptional silica and conductivity removal with minimal particle shedding and high regeneration efficiency.
  • dupont amberjet up 6150 ion exchange resin_d2ee1e86
  • dupont amberjet up 6150 ion exchange resin_d2ee1e86

Features Of DuPont AMBERJET UP 6150 Ion Exchange Resin

  1. Ultra-pure, nuclear-grade, mixed-bed resin designed specifically for ultrapure water (UPW) production in semiconductor and pharmaceutical manufacturing.

  2. Exceptional kinetic performance with rapid regeneration response and low pressure drop across packed beds.

  3. Highly uniform spherical beads ensure consistent hydraulic distribution and minimize channeling or fines generation.

  4. Low total organic carbon (TOC) leachables and minimal silica release—critical for maintaining resistivity >18.2 MΩ·cm.

  5. Optimized anion-to-cation ratio for balanced stoichiometry, delivering stable conductivity control and extended run lengths.

Typical Applications Of DuPont AMBERJET UP 6150 Ion Exchange Resin

  1. Final polishing step in ultrapure water systems for semiconductor wafer fabrication facilities.

  2. Pharmaceutical-grade water (PW and WFI) production requiring USP/EP compliance and low endotoxin carryover.

  3. Power plant boiler feedwater purification where ultra-low silica and sodium are mandatory.

  4. Research laboratory ultrapure water systems demanding reproducible resistivity and minimal ionic contamination.

  5. Electronics manufacturing rinse water loops requiring sub-ppt level ionic impurity removal.

Specifications Of DuPont AMBERJET UP 6150 Ion Exchange Resin

Chemical TypeStrong acid cation (SAC) / strong base anion (SBA) mixed bed
Product FormUniform spherical beads, pre-mixed and pre-converted to H⁺/OH⁻ form
AppearanceOpaque white (cation) and translucent amber (anion) beads; visually homogeneous blend
Primary ApplicationsUltrapure water (UPW) final polishing for semiconductor, pharma, and power industries
Key FeaturesNuclear-grade purity, low TOC leachables, high regeneration efficiency, low silt density index (SDI)
BenefitsExtended service life, reduced downtime, consistent >18.2 MΩ·cm resistivity, minimized risk of device defectivity
Regeneration RequirementRequires separate acid (HCl or H₂SO₄) and caustic (NaOH) regenerants; not regenerable in-situ as mixed bed
Storage ConditionsStore at 5–40 °C; protect from freezing, direct sunlight, and contamination


Get in Touch with ERICW
Let competitive chemical materials go global.

Your Name *

Your Email *

Your Phone

Country

Your Message *