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Ultra-low extractables profile, specifically engineered for ultrapure water (UPW) production in semiconductor and pharmaceutical manufacturing.
Highly uniform spherical beads with narrow particle size distribution (PSD) ensuring consistent hydraulic performance and minimal pressure drop.
Optimized macroporous matrix providing exceptional kinetic performance and resistance to organic fouling.
Strictly controlled ionic purity—meets ASTM D5127 and SEMI F63 standards for trace metal content (<0.1 ppb Na⁺, K⁺, Ca²⁺, Mg²⁺, Fe³⁺).
Pre-packed and pre-conditioned in Class 10 cleanroom environment, ready for direct installation in critical UPW polishing loops.
Final polishing stage in ultrapure water systems for advanced semiconductor fabrication (300 mm wafer fabs).
Pharmaceutical-grade water purification (WFI and PW) compliant with USP <846>, EP 2.2.48, and JP 17.
Critical rinse water treatment in photolithography and wet etch processes.
Ultrapure coolant make-up water for high-power laser and EUV lithography tools.
| Chemical Type | Macroporous strong acid cation exchange resin (sulfonated polystyrene-divinylbenzene) |
| Product Form | Pre-swollen, pre-conditioned gel-free beads |
| Appearance | Uniform amber spherical beads |
| Particle Size Range | 300–1200 µm (95% retained on 300 µm sieve) |
| Moisture Content | 47–51% (as shipped) |
| Exchange Capacity (Na⁺ form) | ≥1.9 eq/L (dry basis) |
| Maximum Operating Temperature | 105 °C |
| Storage Conditions | 5–35 °C, protected from freezing and direct sunlight |
Contact With Us:
E-mail: wangxingqiang@ericwchem.com
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Building A1, Jiete Industrial Park, Huangpu District, Guangzhou City, Guangdong Province, China
