Guangzhou Eric Wei Chemical Co., Ltd.
Guangzhou Eric Wei Chemical Co., Ltd.

Huntsman D-220 Polyetheramine Curing Agent

HuntsmanD-220PolyetheramineCuringAgentisahigh-performancealiphaticdiaminefromtheD-series,designedforcycloaliphaticepoxyresins.Itoffersfastreactivity,excellentflexibility,andlowviscosity,enablingrapidcureatroomtemperaturewithsuperiorchemicalandthermalresistanceidealforcomposites,adhesives,andcoatings.
  • huntsman d 220 polyetheramine curing agent_f54553d6
  • huntsman d 220 polyetheramine curing agent_f54553d6

Features Of Huntsman D-220 Polyetheramine Curing Agent

  1. Low-viscosity liquid enables easy handling, metering, and mixing with epoxy resins.

  2. Fast-reacting aliphatic polyetheramine delivers rapid room-temperature cure kinetics.

  3. Provides excellent flexibility, impact resistance, and low-temperature toughness in cured epoxy systems.

  4. Offers superior moisture tolerance compared to conventional amine curing agents.

  5. Enables formulation of low-VOC, solvent-free epoxy coatings and adhesives.

Typical Applications Of Huntsman D-220 Polyetheramine Curing Agent

  1. High-performance industrial maintenance coatings for steel and concrete substrates.

  2. Structural adhesives in transportation and wind energy composite bonding.

  3. Electrical encapsulants and potting compounds requiring fast turnaround and low exotherm.

  4. Flooring systems including self-leveling and decorative epoxy mortars.

  5. Repair mortars and grouts for infrastructure rehabilitation.

Specifications Of Huntsman D-220 Polyetheramine Curing Agent

Chemical TypeAliphatic polyetheramine (diamine)
Product FormClear, colorless to pale yellow liquid
AppearanceHomogeneous liquid, free from visible particulates or phase separation
Amine Value195–205 mg KOH/g
Viscosity (25°C)80–120 cP
Primary ApplicationsEpoxy coating, adhesive, and composite curing agent
Key FeaturesRoom-temperature cure, low viscosity, flexible network formation
BenefitsImproved processing, reduced cycle time, enhanced toughness and chemical resistance


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