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Ultra-low extractables profile specifically engineered for ultra-high-purity water production in pharmaceutical and biotech manufacturing.
Highly uniform spherical beads with narrow particle size distribution (0.45–0.63 mm) ensuring consistent hydraulic performance and minimal pressure drop.
Exceptional chemical stability in strong oxidizing environments, compatible with hydrogen peroxide and ozone sanitization protocols.
Low total organic carbon (TOC) leachables—validated to meet USP <843> and EP 2.2.48 requirements for purified water systems.
Regenerable with standard NaOH/NaCl solutions; optimized for long service life and predictable capacity retention over multiple cycles.
Final polishing step in pharmaceutical-grade purified water (PW) and water-for-injection (WFI) generation systems.
Ultrapure water treatment for biopharmaceutical process skids and clean-in-place (CIP) rinse water loops.
Critical deionization in semiconductor fab ultrapure water (UPW) sub-loops requiring low silica and boron breakthrough control.
Polishing resin in laboratory-grade water purification systems compliant with ASTM Type I specifications.
End-stage ion removal in single-use bioprocessing buffer preparation systems.
| Chemical Type | Strong base anion exchange resin, Type I, gel matrix, quaternary ammonium functional group |
| Product Form | Moist, spherical beads |
| Appearance | Off-white to light yellow, translucent beads |
| Particle Size Range | 0.45–0.63 mm |
| Uniformity Coefficient | ≤1.6 |
| Moisture Content | 47–53% (as shipped) |
| Functional Capacity (Cl⁻ form) | ≥1.1 eq/L (minimum, measured at 25°C) |
| Maximum Operating Temperature | 60°C |
Contact With Us:
E-mail: wangxingqiang@ericwchem.com
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Building A1, Jiete Industrial Park, Huangpu District, Guangzhou City, Guangdong Province, China
