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Ultra-low extractables profile specifically engineered for ultra-high-purity water production in pharmaceutical and biotech manufacturing.
Highly uniform spherical beads with narrow particle size distribution (0.45–1.25 mm) ensuring consistent hydraulic performance and minimal pressure drop.
Exceptional chemical stability in both acidic and alkaline regenerant solutions, enabling long service life under rigorous cyclic operation.
Low total organic carbon (TOC) leaching—validated to meet USP <843> and EP 2.2.48 requirements for purified water systems.
Optimized for mixed-bed polishing applications where stringent conductivity (<0.1 µS/cm) and silica removal (<0.5 ppb) are critical.
Final polishing stage in pharmaceutical-grade purified water (PW) and water-for-injection (WFI) generation systems.
Ultrapure water (UPW) production for semiconductor front-end manufacturing and photolithography rinse processes.
Critical process water treatment in biologics and monoclonal antibody (mAb) production facilities.
Regulatory-compliant water reuse loops in GMP-certified cleanroom environments.
High-recovery reverse osmosis (RO) permeate polishing in advanced life sciences research laboratories.
| Chemical Type | Strong acid cation (H⁺ form) / strong base anion (OH⁻ form) mixed bed resin |
| Product Form | Uniform spherical beads, pre-mixed 1:1 cation:anion ratio |
| Appearance | Opaque amber cation beads and translucent white anion beads (visually distinguishable) |
| Particle Size Range | 0.45 – 1.25 mm (95% of beads) |
| Moisture Content (as shipped) | 45 – 55% (w/w) |
| Functional Group | Sulfonic acid (cation) / Quaternary ammonium (Type I, anion) |
| Primary Applications | Pharmaceutical PW/WFI, semiconductor UPW, biotech process water |
| Key Certifications | Complies with USP <843>, EP 2.2.48, FDA 21 CFR 173.25; ISO 9001 & ISO 14001 manufactured |
Contact With Us:
E-mail: wangxingqiang@ericwchem.com
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Building A1, Jiete Industrial Park, Huangpu District, Guangzhou City, Guangdong Province, China
