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Ultra-low extractables profile specifically validated for pharmaceutical and bioprocess water systems.
Highly uniform spherical beads ensuring consistent hydraulic performance and minimal pressure drop.
Optimized for mixed-bed polishing applications requiring ultrapure water (UPW) with resistivity >18.2 MΩ·cm.
Manufactured under ISO 9001-certified conditions with full traceability and lot-specific QC documentation.
Resistant to organic fouling due to highly cross-linked macroporous matrix structure.
Final polishing stage in pharmaceutical-grade purified water (PW) and water-for-injection (WFI) generation systems.
Ultrapure water production for semiconductor manufacturing rinse processes.
Biopharmaceutical downstream processing support, including buffer preparation and chromatography system regeneration.
Clean-in-place (CIP) rinse water polishing in aseptic filling facilities.
Research-grade laboratory water systems requiring TOC <1 ppb and silica <0.1 ppb.
| Chemical Type | Strong acid cation (SAC) / strong base anion (SBA) mixed bed resin |
| Product Form | Uniform spherical beads, pre-mixed 1:1 volume ratio |
| Appearance | Opaque white (cation) and translucent amber (anion) beads, visually homogeneous |
| Primary Applications | Ultrapure water polishing for pharma, biotech, and microelectronics |
| Key Features | Low sodium leakage, low TOC elution, high regeneration efficiency |
| Storage Conditions | 5–40 °C; keep container sealed and away from direct sunlight |
| Regeneration Compatibility | NaOH and HCl (standard chemical regeneration) |
| Compliance | USP <643>, EP 2.2.44, ASTM D1193 Type I, ISO 3696 Grade 1 |
Contact With Us:
E-mail: wangxingqiang@ericwchem.com
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Building A1, Jiete Industrial Park, Huangpu District, Guangzhou City, Guangdong Province, China
