Semiconductor Raw Material Specialty Amine Series Monoethanolamine

Features Of Semiconductor Raw Material Specialty Amine Series Monoethanolamine

1. Ultra-high purity (≥99.99% GC) with trace metal impurities strictly controlled to sub-ppb levels (e.g., Na, K, Fe, Cu < 10 ppt).

2. Low volatility and thermally stable formulation optimized for precision semiconductor wet processing environments.

3. Consistent batch-to-batch reproducibility certified via dual QC testing (GC-MS + ICP-MS).

4. Non-corrosive to high-purity quartz, silicon, and stainless-steel process equipment when used within recommended concentration and temperature ranges.

5. Compatible with ultra-low particle generation protocols (<1 particle/mL @ ≥0.1 µm per ISO 14644-1 Class 1).

Typical Applications Of Semiconductor Raw Material Specialty Amine Series Monoethanolamine

1. Formulation component in advanced photoresist strippers for 7 nm–3 nm logic and memory device fabrication.

2. pH buffering agent in post-CMP (Chemical Mechanical Planarization) cleaning solutions for copper/low-k interconnects.

3. Stabilizer and complexing ligand in electroless copper plating baths for through-silicon via (TSV) metallization.

4. Co-solvent in high-selectivity etch inhibitors for SiO₂/SiNₓ pattern transfer processes.

5. Raw material for synthesizing semiconductor-grade amine-functionalized surface modifiers in atomic layer deposition (ALD) precursors.

Specifications Of Semiconductor Raw Material Specialty Amine Series Monoethanolamine

Compatible Systems Of Semiconductor Raw Material Specialty Amine Series Monoethanolamine

Semiconductor Raw Material Specialty Amine Series Monoethanolamine – Frequently Asked Questions (FAQ)

Q1: What is the CAS Number for this specialty monoethanolamine grade?

A: The CAS Number is 141-43-5. This refers specifically to the ultra-high-purity semiconductor-grade monoethanolamine (MEA) conforming to SEMI C37-0322 specifications.

Q2: What is the recommended usage concentration in photoresist stripper formulations?

A: Typical working concentrations range from 5–15 wt% in aqueous-organic blends; exact dosage depends on resist type, film thickness, and process temperature—validation via DOE is strongly advised prior to fab integration.

Q3: How does this specialty MEA differ from commercial-grade monoethanolamine?

A: Unlike technical-grade MEA, this product undergoes multi-stage distillation, sub-micron filtration, and inert-gas purging to achieve <10 ppt metallic impurities, <0.1 NTU haze, and zero detectable amines (e.g., diethanolamine, triethanolamine) by GC-MS.

Q4: Is there data available on extractables/migratables into UPW streams?

A: Yes—per SEMI F57-0301 testing, extractables in UPW at 25 °C after 72-hr contact are <0.5 ppb total organic carbon (TOC), with no detectable amine-related byproducts (LOD: 0.05 ppb via LC-MS/MS).

Q5: Does this material meet USP or EP pharmaceutical standards?

A: No—it is engineered exclusively for semiconductor manufacturing and does not carry USP/EP monograph compliance; it meets SEMI C37, ASTM D1193 Type I water compatibility, and JEDEC J-STD-020 moisture sensitivity requirements.