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Highly fluorinated rigid bicyclic scaffold providing exceptional thermal and oxidative stability.
Enhanced hydrophobicity and chemical inertness due to perfluorination of bridgehead and aromatic positions.
Unique through-space electronic coupling between para-substituted benzene rings enables tailored optoelectronic behavior.
Crystalline solid with well-defined molecular geometry—ideal for precision thin-film deposition and supramolecular engineering.
Low surface energy and high volatility under reduced pressure, facilitating purification via sublimation.
Advanced organic semiconductor layer in high-performance OLEDs and OFETs.
Building block for fluorinated porous organic frameworks (POFs) and covalent organic frameworks (COFs).
Surface modifier for anti-fouling coatings in microfluidic and biomedical diagnostic devices.
Thermally stable dopant or host matrix in radiation-hardened luminescent materials.
Model compound in fundamental studies of through-bond vs. through-space charge transfer mechanisms.
| Chemical Type | Fluorinated cyclophane – strained [2.2]paracyclophane derivative |
| Product Form | Crystalline powder |
| Appearance | White to off-white crystalline solid |
| Melting Point | 248–252 °C (decomposes above 260 °C) |
| Primary Applications | Organic electronics, functional materials synthesis, surface science research |
| Key Features | Perfluorinated bridgehead carbons; symmetrical D2h symmetry; sublimable purity grade |
| Benefits | Improved film uniformity, enhanced environmental stability, reduced intermolecular aggregation |
| Regulatory Compliance | REACH registered; not classified under CLP Regulation (no hazard pictograms assigned) |
| Common Compatible Systems | Suitability |
| Thermal Evaporation Systems (e.g., K.J. Lesker, Angstrom Engineering) | Highly Recommended – Sublimes cleanly at 180–210 °C under ≤1×10⁻⁶ mbar |
| Halogenated Solvent-Based Processing (e.g., chlorobenzene, o-dichlorobenzene) | Recommended – Moderate solubility (~4–6 mg/mL at 60 °C); stable for >72 h |
| Spin-Coating & Vacuum Deposition Platforms | Highly Recommended – Forms pinhole-free amorphous films on ITO, SiO₂, and PEDOT:PSS substrates |
| Grignard or n-BuLi Mediated Cross-Coupling Reactions | Suitable – Stable under anhydrous, inert conditions; requires activated aryl halide partners |
Q1: What is the CAS Registry Number for this compound?
A: The CAS Number is 1822597-41-1.
Q2: What is the recommended processing concentration for solution-based thin-film fabrication?
A: For spin-coating, use 2–5 mg/mL in hot chlorobenzene (60–70 °C); pre-filter through a 0.2 µm PTFE syringe filter immediately before deposition.
Q3: How does it compare to non-fluorinated [2.2]paracyclophane in terms of thermal stability and film-forming behavior?
A: It exhibits ~65 °C higher decomposition onset (TGA 5% weight loss) and forms more homogeneous, lower-surface-energy films due to suppressed π–π stacking and enhanced conformational rigidity.
Q4: Is extraction or migration observed under standard ISO 10993-12 simulated physiological conditions?
A: No detectable leachables (<0.1 ppm) were observed after 72 h immersion in 50% ethanol/water at 37 °C, per validated LC-MS/MS testing protocols.
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