Guangzhou Eric Wei Chemical Co., Ltd.
Guangzhou Eric Wei Chemical Co., Ltd.

EW-3000C/2006/8009 Static Eliminating Concentrate

EW-3000C/2006/8009 is a high-performance static eliminating concentrate from the EW series by Chemtronics. Formulated for precision electronics and cleanroom applications, it rapidly neutralizes electrostatic charges on surfaces and materials. Compatible with automated dispensing systems, it leaves no residue and meets ISO Class 5 standards. Ideal for PCB handling, plastic film processing, and medical device manufacturing where ESD control is critical.
  • ew 3000c 2006 8009 static eliminating concentrate_386b6a31
  • ew 3000c 2006 8009 static eliminating concentrate_386b6a31

Features Of EW-3000C/2006/8009 Static Eliminating Concentrate

  1. Ultra-low ionic residue formulation minimizes risk of corrosion or contamination in sensitive electronic and optical manufacturing environments.

  2. Non-volatile, water-based concentrate designed for stable long-term performance without solvent evaporation or film re-deposition.

  3. Rapid static decay (<500 ms at 1 kV) under controlled RH (40–60%) when diluted per recommended protocols.

  4. pH-neutral (6.8–7.2) to ensure compatibility with common engineering plastics, coated substrates, and stainless-steel equipment surfaces.

  5. Free of halogens, heavy metals, and intentionally added PFAS compounds — aligned with evolving industrial sustainability standards.

Typical Applications Of EW-3000C/2006/8009 Static Eliminating Concentrate

  1. Pre-treatment rinse for semiconductor wafers and photomasks prior to lithography or metrology steps.

  2. Static control additive in precision cleaning formulations for medical device assembly cleanrooms (ISO Class 5–7).

  3. In-line dilution system for high-speed web handling of PET, PP, and PC films in packaging and label converting lines.

  4. Final rinse component in aqueous parts washers used for aerospace components requiring low particulate and electrostatic discharge (ESD) safety.

  5. Formulation base for custom ESD-safe cleaners targeting optical lenses, display glass, and MEMS sensor housings.

Specifications Of EW-3000C/2006/8009 Static Eliminating Concentrate



Chemical TypeNon-ionic surfactant blend with synergistic humectants and conductivity enhancers
Product FormLiquid concentrate (ready-to-dilute)
AppearanceClear, pale amber, free of sediment or haze
Specific Gravity (25°C)1.03 ± 0.02 g/cm³
pH (1% aqueous solution, 25°C)6.9–7.1
Primary ApplicationsESD control in critical aqueous cleaning, rinsing, and surface conditioning processes
Key FeaturesLow foaming, non-staining, non-corrosive to aluminum and anodized surfaces
Regulatory ComplianceREACH compliant; RoHS 2015/863 Annex II (SVHC-free); SDS available upon request


Compatible Systems Of EW-3000C/2006/8009 Static Eliminating Concentrate

Common Compatible SystemsSuitability
Modutek Aqueous Batch Cleaners (e.g., QDR, SDR)Highly Recommended – Fully validated for inline metering and temperature stability up to 75°C
Ultrasonics International Ultrasonic Rinse Tanks (30–60 kHz)Recommended – Requires pre-dilution to ≤0.5% v/v; no cavitation interference observed
Alconox® Tergazyme®-based cleaning linesSuitable – Compatible as post-rinse additive; no enzymatic activity inhibition confirmed
Custom-built spray-in-air conveyor rinsersHighly Recommended – Optimized for low-residue atomization and rapid drying profiles

EW-3000C/2006/8009 Static Eliminating Concentrate – Frequently Asked Questions (FAQ)

Q1: What is the CAS Registry Number for EW-3000C/2006/8009?

A: The product is a proprietary multi-component formulation; individual CAS numbers are not assigned to the concentrate. Full ingredient disclosure (including CAS numbers for all ≥0.1% constituents) is provided in Section 3 of the Safety Data Sheet (SDS).


Q2: What is the typical working concentration range, and how is it measured?

A: Recommended use concentration is 0.1–0.8% v/v in deionized water (1–8 mL per liter). Conductivity measurement (target range: 15–80 μS/cm at 25°C) is the preferred in-process verification method over refractive index due to ionic sensitivity.


Q3: How does EW-3000C/2006/8009 differ from conventional quaternary ammonium (quat)-based antistats?

A: Unlike quat-based products, EW-3000C/2006/8009 relies on non-ionic, hydrophilic film-forming agents that do not migrate or extract under thermal cycling or solvent exposure—eliminating risk of lens hazing, sensor fouling, or downstream ionic contamination.


Q4: Is migration or leaching into polymer substrates a concern during high-humidity storage?

A: No measurable migration occurs into standard engineering thermoplastics (e.g., PC, ABS, PEEK) after 72 hrs at 85% RH/40°C, as verified by FTIR-ATR surface analysis and surface resistivity monitoring.


Q5: Does EW-3000C/2006/8009 meet ISO 10993 or USP <87>/<88> biocompatibility requirements?

A: It is not certified for direct biological contact per ISO 10993 or USP chapters. However, it is widely used in final rinse steps for Class II/III medical devices where residual limits are validated via TOC and conductivity testing per internal PQ protocols.



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