Non-corrosive formulation specifically engineered to remove silver oxide residues without attacking underlying silver, copper, or palladium metallization.
pH-neutral (6.8–7.2) aqueous solution ensures compatibility with sensitive electronic components and solder masks.
Rapid dissolution kinetics—achieves >95% silver oxide removal within 60–120 seconds at ambient temperature (20–25°C).
Low-VOC, non-halogenated chemistry compliant with IPC-J-STD-033 and RoHS 3 (EU Directive 2015/863) requirements.
Leaves no ionic residue; passes IPC-TM-650 2.3.25 surface insulation resistance (SIR) testing after rinsing and drying.
Cleaning silver-plated contacts and switch contacts in automotive sensors and relay assemblies.
Post-reflow cleaning of Ag-filled conductive adhesives and silver paste residues on hybrid microcircuits.
Removal of tarnish and oxidation from silver-based bonding wires and die-attach pads in power semiconductor modules.
Maintenance cleaning of silver-coated RF shielding gaskets and EMI suppression components.
Pre-encapsulation surface preparation for silver-metallized ceramic substrates in high-reliability aerospace electronics.
| Chemical Type | Aqueous chelating complex with organic acid buffers and non-ionic surfactants |
| Product Form | Clear, colorless liquid concentrate (ready-to-use after dilution) |
| Appearance | Transparent, homogeneous solution; no sediment or phase separation |
| Dilution Ratio | 1:5 to 1:10 (v/v) with deionized water (recommended: 1:7) |
| pH (1:7 dilution, 25°C) | 6.9 ± 0.2 |
| Primary Applications | Electronics assembly cleaning, precision metal oxide removal, post-process residue management |
| Key Features | Non-oxidizing, non-acidic, non-phosphated, low foaming, air-stable |
| Regulatory Compliance | RoHS 3 compliant; REACH SVHC-free; no listed TSCA or IARC carcinogens |
| Common Compatible Systems | Suitability |
| Batch immersion cleaning systems (stainless steel tanks) | Highly Recommended – Resists corrosion; compatible with standard polypropylene and PVDF liners |
| Ultrasonic cleaning equipment (40–80 kHz) | Recommended – Effective cavitation enhancement; no degradation of transducer coupling media |
| Inline spray-in-air conveyor systems | Suitable – Low foam profile enables stable nozzle operation and uniform coverage |
| Manual wipe-down stations with lint-free wipes | Highly Recommended – Rapid evaporation rate minimizes streaking; safe for operator handling with gloves |
Q1: What is the CAS Registry Number for KEY-288?
A: KEY-288 is a proprietary multi-component formulation; individual ingredients are disclosed under confidentiality and do not carry a single CAS number. Full ingredient disclosure is available under signed CDA per customer request.
Q2: What is the recommended contact time and temperature range for optimal performance?
A: For most applications, 90 seconds at 20–25°C (ambient) is sufficient. At elevated temperatures (35–45°C), contact time may be reduced to 45 seconds—however, prolonged exposure (>180 sec) above 45°C is not advised to prevent potential surfactant film formation.
Q3: How does KEY-288 compare to traditional nitric acid or sodium persulfate cleaners?
A: Unlike aggressive oxidizers (e.g., HNO₃) or strong salts (Na₂S₂O₈), KEY-288 operates via selective chelation—preserving base metal integrity, eliminating hydrogen embrittlement risk, and avoiding hazardous fumes or heavy metal waste streams.
Q4: Does KEY-288 meet IPC-CC-830B for electrical insulation properties after cleaning?
A: Yes—when used per instructions and followed by DI water rinse (≥2 min) and forced-air drying (60°C, 10 min), KEY-288-treated surfaces consistently achieve ≥100 MΩ insulation resistance per IPC-CC-830B Section 4.3.2.
Q5: Is there any risk of silver ion migration or leaching into adjacent dielectrics after cleaning?
A: No—KEY-288 contains no free halides or complexing agents that promote Ag⁺ mobility. Independent ion chromatography testing confirms <0.05 ppm residual silver in final rinse water, well below JEDEC JESD22-A108F migration thresholds.
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E-mail: wangxingqiang@ericwchem.com
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