Guangzhou Eric Wei Chemical Co., Ltd.
Guangzhou Eric Wei Chemical Co., Ltd.

Polishing Solution and Stripper Raw Material Propylene Glycol Methyl Ether Acetate

Dow Chemical’s DOWANOL™ PMA is a high-purity propylene glycol methyl ether acetate used as raw material in precision polishing solutions and photoresist strippers. Featuring low toxicity, excellent solvency for resins and polymers, fast evaporation rate, and water miscibility, it ensures consistent performance in semiconductor and display manufacturing cleaning processes.
  • polishing solution and stripper raw material propylene glycol methyl ether aceta_52863d00
  • polishing solution and stripper raw material propylene glycol methyl ether aceta_52863d00

Features Of Polishing Solution and Stripper Raw Material Propylene Glycol Methyl Ether Acetate

  1. High solvency power for resins, lacquers, and cured coatings without aggressive corrosion to substrates.

  2. Low volatility and favorable evaporation rate—enables controlled film formation and residue-free drying.

  3. Excellent water-miscibility and compatibility with common co-solvents (e.g., alcohols, glycol ethers).

  4. Low odor profile and reduced workplace exposure risk compared to traditional chlorinated or aromatic strippers.

  5. Non-halogenated and non-ozone-depleting—supports sustainable formulation goals under global EHS frameworks.

Typical Applications Of Polishing Solution and Stripper Raw Material Propylene Glycol Methyl Ether Acetate

  1. Active ingredient in aqueous-based industrial paint and varnish strippers for metal and wood substrates.

  2. Key solvent carrier in precision optical lens polishing solutions for anti-reflective and hard-coat removal.

  3. Co-solvent in semiconductor wafer cleaning formulations for photoresist and post-etch residue stripping.

  4. Performance enhancer in automotive refinish clearcoat thinners and blending agents for high-gloss polish systems.

  5. Functional component in electronics-grade conformal coating removers used in PCB rework and repair.

Specifications Of Polishing Solution and Stripper Raw Material Propylene Glycol Methyl Ether Acetate



Chemical TypeGlycol ether ester (PGMEA)
Product FormClear, colorless liquid
AppearanceTransparent, free of suspended matter or haze
Melting Point−85 °C (approx.)
Boiling Point (at 760 mmHg)146–148 °C
Density (20 °C)0.930–0.935 g/cm³
Solubility in WaterComplete miscibility
Regulatory ComplianceREACH registered; TSCA listed; non-Prop 65 listed (California); VOC-exempt in most U.S. jurisdictions (per EPA Method 24)


Compatible Systems Of Polishing Solution and Stripper Raw Material Propylene Glycol Methyl Ether Acetate

Common Compatible SystemsSuitability
Aqueous alkaline stripper formulations (e.g., sodium hydroxide + surfactant blends)Highly Recommended – Enhances resin swelling and interfacial penetration without phase separation
Acrylic and polyurethane-based polishing slurriesRecommended – Improves dispersion stability and surface wetting on coated optics
Electronics-grade isopropanol (IPA) and ethanol dilution systemsHighly Recommended – Maintains low surface tension and rapid flash-off in cleanroom applications
Waterborne epoxy and polyester coating removersSuitable – Effective at ≤30 wt% loading; requires pH stabilization to prevent ester hydrolysis

Polishing Solution and Stripper Raw Material Propylene Glycol Methyl Ether Acetate – Frequently Asked Questions (FAQ)

Q1: What is the CAS Registry Number for Propylene Glycol Methyl Ether Acetate?

A: The CAS number is 108-65-6.


Q2: What is the typical recommended concentration range when formulating a stripping solution?

A: For industrial aqueous strippers, use 5–20 wt%; for high-performance optical polishers, 15–35 wt% is common—always validate via compatibility and residue testing per substrate.


Q3: How does PGMEA compare to ethyl acetate or NMP in stripping efficiency and safety?

A: PGMEA offers higher solvency than ethyl acetate for crosslinked polymers and lower toxicity than NMP (no reproductive hazard classification); it also exhibits superior water compatibility and lower vapor pressure than both.


Q4: Is PGMEA subject to migration or leaching concerns in food-contact or medical device cleaning applications?

A: PGMEA is not approved for direct food-contact applications under FDA 21 CFR §175.300 or EU 10/2011; residual limits must be validated per ISO 10993-12 for medical device cleaning—typically <1 ppm in final rinse water.


Q5: Does PGMEA require special handling for regulatory compliance in the EU or North America?

A: Yes—it is classified as Eye Irritant (H319) and Skin Irritant (H315) under CLP/GHS; SDS must reflect this. It is exempt from VOC reporting in most U.S. states but requires full REACH documentation (including SVHC screening) for EU supply.



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