Semiconductor Raw Material Specialty Amine Series Triethylamine

Features Of Semiconductor Raw Material Specialty Amine Series Triethylamine

1. Ultra-high purity (≥99.99% GC), rigorously controlled for trace metal content (Na, K, Fe, Cu < 10 ppb) to prevent semiconductor device contamination.

2. Low volatility and optimized vapor pressure profile for precise vapor-phase delivery in CVD/ALD processes.

3. Consistent batch-to-batch reproducibility with certified analytical reports (CoA) per lot, including NMR and GC-MS verification.

4. Stabilized formulation with proprietary antioxidant system to inhibit amine oxidation and extend shelf life under inert storage.

5. Manufactured in ISO 9001- and ISO 14001-certified cleanroom facilities compliant with SEMI S2/S8 safety and environmental standards.

Typical Applications Of Semiconductor Raw Material Specialty Amine Series Triethylamine

1. Catalyst and ligand precursor in atomic layer deposition (ALD) of high-k dielectric films (e.g., Al₂O₃, HfO₂).

2. Reducing agent and complexing ligand in solution-based synthesis of metal-organic precursors for copper interconnect metallization.

3. pH modulator and co-catalyst in photoresist development formulations for advanced lithography (EUV and ArF immersion).

4. Surface passivation additive in post-CMP cleaning chemistries to suppress metal ion redeposition.

5. Key reagent in the synthesis of nitrogen-doped carbon nanomaterials used in next-generation semiconductor packaging substrates.

Specifications Of Semiconductor Raw Material Specialty Amine Series Triethylamine

Compatible Systems Of Semiconductor Raw Material Specialty Amine Series Triethylamine

Semiconductor Raw Material Specialty Amine Series Triethylamine – Frequently Asked Questions (FAQ)

Q1: What is the CAS Registry Number for this grade of triethylamine?

A: The CAS number is 121-44-8. This specific semiconductor-grade material carries an additional lot-specific purity designation and trace metal certification beyond standard commercial triethylamine.

Q2: What is the recommended dosage range when used in ALD precursor synthesis?

A: Typical stoichiometric ratios range from 1.2:1 to 3:1 (triethylamine : metal halide), depending on the target complex. Exact optimization requires empirical testing under process-relevant conditions; application support documentation is provided with each shipment.

Q3: How does this specialty amine differ from technical-grade triethylamine in terms of extractables and leachables?

A: Unlike technical grades, this product undergoes multi-stage sub-micron filtration and fractional distillation under nitrogen, reducing volatile organic impurities (VOCs) and non-volatile residues by >99%. Extractables testing per SEMI F57 shows <5 ng/cm² total organics after exposure to 18.2 MΩ·cm DI water at 60 °C for 24 h.

Q4: Is this material certified for use in Class 10 cleanroom environments?

A: Yes — all packaging (including fluoropolymer-lined bottles and crimp-sealed glass ampoules) is certified for Class 10 (ISO 4) cleanroom use per ISO 14644-1. Particulate testing per SEMI F32 confirms ≤1 particle ≥0.5 μm per mL in dispensed liquid.