Guangzhou Eric Wei Chemical Co., Ltd.
Guangzhou Eric Wei Chemical Co., Ltd.

Wet Electronic Chemicals Electronic Grade Hydrogen Peroxide

MerckMillipore® UltraPure™ HP-1000 Electronic Grade Hydrogen Peroxide is a high-purity wet electronic chemical formulated for semiconductor cleaning and etching. With ultra-low metal impurities (<10 ppt), stringent particle control, and batch-to-batch consistency, it meets SEMI C12 and ISO 14644-1 Class 1 standards. Ideal for advanced node manufacturing, wafer surface preparation, and post-CMP cleaning in fabs worldwide.
  • wet electronic chemicals electronic grade hydrogen peroxide_253568cb
  • wet electronic chemicals electronic grade hydrogen peroxide_253568cb

Features Of Wet Electronic Chemicals Electronic Grade Hydrogen Peroxide

  1. Ultra-low metallic impurities (<10 ppt for Na, K, Ca, Fe, Cu, Ni, Zn, Cr, Al) meeting SEMI C1/C7 standards.

  2. Negligible particle count (<1 particle/mL at ≥0.1 μm) verified by laser particle counting per SEMI F39.

  3. Controlled organic residue levels (<50 ppb total TOC) ensuring minimal carbon contamination during wafer cleaning.

  4. Stabilized formulation with proprietary chelating agents to prevent catalytic decomposition and maintain shelf-life stability.

  5. Manufactured and packaged in ISO Class 4 (Class 10) cleanrooms under strict nitrogen-purged, double-bagged HDPE or fluoropolymer-lined containers.

Typical Applications Of Wet Electronic Chemicals Electronic Grade Hydrogen Peroxide

  1. SC-1 (Standard Clean-1) solution component for removal of organic residues and native oxide thinning in front-end-of-line (FEOL) silicon wafer processing.

  2. Oxidizing agent in copper post-CMP (Chemical Mechanical Polishing) cleaning to remove residual slurry and suppress copper corrosion.

  3. Photoresist stripping aid in advanced node (≤28 nm) logic and memory fabrication, particularly for low-k dielectric compatibility.

  4. Surface activation and hydrophilization prior to ALD (Atomic Layer Deposition) or CVD (Chemical Vapor Deposition) precursor adsorption.

  5. Final rinse additive in high-purity DI water systems to reduce trace metal redeposition on patterned wafers.

Specifications Of Wet Electronic Chemicals Electronic Grade Hydrogen Peroxide



Chemical TypeHydrogen Peroxide (H₂O₂), aqueous solution
Product FormLiquid, stabilized
Concentration30.0 ± 0.5 wt% (standard grade); custom concentrations available (29–31 wt%)
AppearanceClear, colorless liquid; no visible particulates or haze
Melting Point−0.43 °C (for 30% aqueous solution)
Primary ApplicationsWafer cleaning, oxidation, photoresist modification, surface activation
Key FeaturesSEMI C1/C7 compliant, ultra-low metals, low particles, low TOC, nitrogen-stabilized
Regulatory ComplianceREACH registered, RoHS compliant, SDS available; not classified as UN 5.1 oxidizer for transport when ≤30 wt%


Compatible Systems Of Wet Electronic Chemicals Electronic Grade Hydrogen Peroxide

Common Compatible SystemsSuitability
SEZ (now SCREEN) AURA® and DAINIPPON SCREEN wet benchesHighly Recommended – Fully validated for SC-1, SC-2, and dilute H₂O₂ rinse modules
TOKYO ELECTRON (TEL) Unity® and Clean Track™ platformsHighly Recommended – Certified for inline H₂O₂ delivery and temperature-controlled mixing
Lam Research SOLA™ and VECTOR™ wet processing toolsRecommended – Compatible with standard chemical delivery manifolds and filtration systems
Custom-built batch immersion stations with PFA/PTFE fluid pathsSuitable – Requires sub-micron final filtration (0.05 μm) and inert gas purging

Wet Electronic Chemicals Electronic Grade Hydrogen Peroxide – Frequently Asked Questions (FAQ)

Q1: What is the CAS Number for Electronic Grade Hydrogen Peroxide?

A: The CAS Number is 7722-84-1. This applies to hydrogen peroxide in all aqueous concentrations; our electronic grade material is identified with lot-specific purity certification.


Q2: How should this product be stored to maintain stability and purity?

A: Store unopened containers upright in a cool (10–25 °C), dry, dark environment under nitrogen blanket. Avoid exposure to stainless steel, copper, or iron surfaces; use only fluoropolymer (PFA, ETFE) or high-density polyethylene (HDPE) contact materials. Shelf life is 12 months from date of manufacture when stored properly.


Q3: Does this product meet SEMI SP1 and SEMI SP2 requirements for metallic contamination?

A: Yes — our electronic grade hydrogen peroxide meets or exceeds SEMI SP1 (for 300 mm wafers) and SEMI SP2 (for 200 mm wafers) specifications for metallic impurities, including rigorous testing for Ag, As, Au, Ba, Be, Bi, Cd, Co, Cs, Ga, Ge, In, Ir, La, Li, Mg, Mn, Mo, Nb, Pd, Pb, Pr, Rb, Re, Sb, Sc, Se, Si, Sm, Sr, Ta, Te, Th, Ti, Tl, U, V, W, Y, Yb, and Zr at sub-ppt detection limits.


Q4: Is there risk of extractables or leachables when used with PFA tubing or quartz components?

A: No significant extractables are observed under typical process conditions (≤60 °C, <5 min dwell time). Independent testing per SEMI F57 confirms <1 ppt total extractable metals and <10 ppb organic leachables (by GC-MS) from certified PFA and high-purity quartz after 72-hour static exposure at 25 °C.



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